Illumination optical system, exposure apparatus, a

专利名称：Illumination optical system, exposure

apparatus, and exposure method

发明人：Osamu Tanitsu,Hirohisa Tanaka,Kenichi

Muramatsu,Norio Komine,Hisashi

Nishinaga,Tomoyuki Matsuyama,TakehitoKudo

申请号：US11979517申请日：20071105

公开号：US20080074632A1公开日：20080327

专利附图：

摘要：An illumination optical system for, when installed in an exposure system,realizing a suitable illumination condition by varying the polarized state of the

illumination light according to the pattern characteristics of the mask while suppressingthe loss of the intensity of the light. The illumination optical system has a light sourceunit for supplying a linearly polarized light for illuminating surfaces to be illuminatedtherewith, and a polarized state changing device for changing the polarized state of theilluminating light from a predetermined polarized state to a nonpolarized state and viceversa. The polarized state changing device is arranged in the optical path between thelight source unit and the surfaces to be illuminated. The polarized state changing devicecan be removed from the illumination optical path and has a depolarizer for selectivelydepolarizing the incident linearly polarized light.

申请人：Osamu Tanitsu,Hirohisa Tanaka,Kenichi Muramatsu,Norio Komine,HisashiNishinaga,Tomoyuki Matsuyama,Takehito Kudo

地址：Kumagaya-shi JP,Kumagaya-shi JP,Sagamihara-shi JP,Sagamihara-shi JP,TokimaJP,Korihashi-machi JP,Kumagaya-shi JP

国籍：JP,JP,JP,JP,JP,JP,JP

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